Paper Title :Fabrication of Low Cost Atomic Layer Deposition System for the Preparation of Ultrathin ZnO Films for Optoelectronic Applications

Author :T.V.Lidiya, K.Rajeev Kumar

Article Citation :T.V.Lidiya ,K.Rajeev Kumar , (2017 ) " Fabrication of Low Cost Atomic Layer Deposition System for the Preparation of Ultrathin ZnO Films for Optoelectronic Applications " , International Journal of Mechanical and Production Engineering (IJMPE) , pp. 67-70, Volume-5,Issue-3

Abstract : . A low cost atomic layer deposition system was designed and fabricated for the deposition of Ultra thin Zinc oxide films. Diethyl iethyl Zinc and Deionized water were used as Zinc and Oxygen precursors respectively and high pur purity Argon gas as purging gas. Ultra thin layer of ZnO was prepared on glass substrates. substrate . The deposited thin film films were investigated for structural, optical and morphological studies using Glancing angle X-ray diffraction (GAXRD), Spectroscopic pectroscopic ellipsometer, UV–VIS VIS spectrometer, Scanning electron microscope etc Index terms: Atomic layer deposition, System Fabrication, Ultrathin ZnO film, GAXRD

Type : Research paper

Published : Volume-5,Issue-3

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